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LOR and PMGI resists are based onpolydimethylglutarimide. Its unique properties enableLOR and PMGI products to perform exceptionally wellwhen used, either as a sacrificial layer, or as an undercutlayer in bi-layer lift-off processing. LOR and PMGI resistsare designed for applications requiring high resolutionimaging, easy process tuning, high yields and superiordeposition line width control. Mainstream applicationsutilizing LOR or PMGI resists include GMR & MR heads,wireless devices, opto-electronics, MEMs, and packaging.